MOSFET
栅氧化层
降级(电信)
材料科学
栅极电压
电子工程
光电子学
氧化物
转身(生物化学)
电气工程
电压
逻辑门
碳化硅
计算机科学
工程类
晶体管
化学
冶金
生物化学
作者
Jiahong Liu,Bo Yao,Xing Wei,Yichi Zhang,Huai Wang
标识
DOI:10.1109/tpel.2024.3363421
摘要
This letter proposes a SiC MOSFET gate oxide degradation monitoring method based on the peak value of the bandpass filtered gate voltage during turn-on transitions. The frequency range of the bandpass filter is determined to ensure a proper sensitivity of the detected peak value to the degradation level. The monitoring circuit is presented, including an analog bandpass filter, a peak detector, and a reset pulse generator. Comparing to the existing monitoring schemes, the proposed method is non-invasive and minimizes the interference and new risks to the normal operation of the gate driver. Besides, the proposed monitoring circuit is cost-effective with reduced complexity and less sampling frequency requirement. Multiple high-temperature gate bias (HTGB) tests are performed to accelerate the aging of SiC devices with planar, double trench, and asymmetric trench gate structures. Experimental results from a double pulse tester and a three-phase inverter under dynamic operation verify the effectiveness of the proposed health indicator and the monitoring circuit.
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