计量学
量子计量学
光子学
一套
尺寸计量学
计算机科学
测距
光学物理学
领域(数学)
干涉测量
光学
物理
天文干涉仪
纳米技术
光学工程
量子传感器
量子点
量子光学
光学材料
量子
工程类
光场
作者
Hui Yang,Yingjie Gu,Meiyu Peng,Hairong He,Zhiquan Chen,Ruibo Jin,Xunwei Xu,Yu Chen,Guangtao Cao,Enduo Gao,Hui Yang,Hui Jing
摘要
ABSTRACT Optical metrology has played a crucial role in the advancement of science and technology. In optical metrology, the fundamental properties of light are skillfully employed as information carriers, enabling accurate measurement of numerous physical quantities. However, conventional optical metrology systems have typically involved a suite of different optical components, which make them bulky and difficult for chip‐scale integration. Recently, the emerging metasurfaces have provided a revolutionary solution for powerful and integrated optical metrology, which showcase advantages well beyond conventional devices. Here, we review the latest cutting‐edge in exciting field of metasurface‐based metrology, ranging from classical to quantum realms. We describe in detail both the fundamental principles and typical metrology strategies for measuring different physical quantities, including wavelength, polarization, phase, displacement, and refractive index. Prominent examples of such technologies in presented applications such as optical imaging, photonic spectrometers, micro sensors and quantum interferometers have been thoroughly discussed. We also discuss and outlook the challenges and opportunities on this emerging field.
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