跨导
饱和(图论)
电子迁移率
符号
高电子迁移率晶体管
晶体管
材料科学
物理
拓扑(电路)
数学
光电子学
量子力学
组合数学
算术
电压
作者
Hyo-Jin Kim,Ji-Hoon Yoo,Wan-Soo Park,Seung-Won Yun,Hyeon-Bhin Jo,In-Geun Lee,Tae‐Woo Kim,Takuya Tsutsumi,Hiroki Sugiyama,Hideaki Matsuzaki,Jae‐Hak Lee,Dae-Hyun Kim
标识
DOI:10.1109/led.2022.3230966
摘要
Conventional techniques to characterize the carrier transport properties in high-electron-mobility transistors do not account for the effect of each individual unit process and device integration, and can be challenging to use for short-channel devices. To overcome this, we have developed a new technique that consists of measurement and analysis of the transconductance scaling behavior. The proposed ${g}_{m}$ modeling technique yielded the effective mobility, $\mu _{n\_{}{\textit {eff}}}$ , and saturation velocity, ${v}_{\textit {sat}}$ for fabricated InxGa $_{{1}-{x}}$ As Quantum-Well (QW) HEMTs, correlating the carrier transport properties to the device characteristics. This helps illuminate the physics of the carrier transport properties of HEMTs from the mobility relevant to the velocity saturation regimes.
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