光探测
紫外线
光电流
量子效率
材料科学
物理
光电探测器
光电子学
作者
Maolin Zhang,Wanyu Ma,Shan Li,Lili Yang,Zeng Liu,Yufeng Guo,Weihua Tang
标识
DOI:10.1109/ted.2023.3253671
摘要
Ultrawide bandgap semiconductor gallium oxide (Ga2O3) demonstrates a considerable advantage in detecting deep-ultraviolet (DUV) light signals in extreme environments. Relevant studies have shown that the Ga2O3 DUV photodetector (PD) is a promising candidate for high-temperature applications; however, its temperature-influenced photodetection performance has yet to be investigated. In this work, a Ga2O3 metal–semiconductor–metal (MSM) DUV PD was fabricated, and its temperature-dependent photodetection performance was studied. Decent detection metrics, including a photo-to-dark current ratio (PDCR) of $1.1\times 10^{{6}}$ , a responsivity ( ${R}$ ) of 45.83 mA/W, a specific detectivity ( ${D}^{\ast }$ ) of $3.4\times 10^{{13}}$ Jones, and an external quantum efficiency (EQE) of 22.4%, were achieved but decreased with increasing temperature. The increased operation temperature led to an increase in the dark current and a decrease in the photocurrent. In addition, the impact of high temperature on the photocurrent gain mechanism was examined in detail based on carrier recombination and transport processes. In general, impressive robustness of the Ga2O3 MSM DUV PD was achieved, further stressing the detection capability of Ga2O3 DUV PDs in harsh environments.
科研通智能强力驱动
Strongly Powered by AbleSci AI