泥浆
抛光
材料科学
复合材料
增稠
膨胀的
剪切(地质)
化学机械平面化
剪应力
高分子科学
作者
Lianmin Yin,Yifan Dai,Hao Hu,Chaoliang Guan
摘要
Elastic emission polishing (EEM) has excellent polishing surface quality, and shear thickening can improve polishing removal efficiency. This paper mainly studies the effect of shear thickening slurry on EEM. Firstly, the polishing device and removal mechanism based on shear thickening are introduced. Then a single-point contrast polishing experiment was carried out. It is found that the shear thickening slurry can improve the removal efficiency of ordinary EEM, the former is about 2.7 times that of the latter.
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