材料科学
功率MOSFET
重离子
泄漏(经济)
MOSFET
碳化硅
光电子学
离子
电流(流体)
电气工程
工程物理
电压
晶体管
物理
工程类
冶金
经济
宏观经济学
量子力学
作者
K. Niskanen,C. Martinella,Arijit Sengupta,P. M. Harris,Arthur F. Witulski,H. Kettunen,Arto Javanainen
标识
DOI:10.1109/tns.2025.3531204
摘要
Temperature dependence of the heavy-ion induced leakage current in silicon carbide ( SiC ) power MOSFETs has been studied. The devices exhibit an order of magnitude lower degradation rate for drain current at elevated temperatures compared to the values measured at a room temperature. The degradation rates at different drain voltages and at different temperatures were determined. The effect of temperature on degradation of device parameters is presented, the degradation mechanisms and implications to the power applications in radiation environments are discussed.
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