Evaluation of the self-cleaning ability of MoO3 thin films prepared by radio frequency magnetron sputtering using a quartz crystal microbalance technique
可缩放矢量图形
计算机图形学(图像)
计算机科学
万维网
作者
Naoki Shimosako,Kunihiko Takahashi,Hiroshi Sakama
出处
期刊:Thin Solid Films [Elsevier BV] 日期:2024-12-15卷期号:809: 140584-140584被引量:1