记忆电阻器
异质结
材料科学
反铁电性
电阻式触摸屏
光电子学
纳米技术
电子工程
电气工程
铁电性
工程类
电介质
作者
Meng-Hsuan Yang,Che‐Hung Wang,Yu‐Hong Lai,Chien-Hua Wang,Yen‐Jung Chen,Jui‐Yuan Chen,Ying‐Hao Chu,Wen‐Wei Wu
出处
期刊:Nano Letters
[American Chemical Society]
日期:2024-08-19
卷期号:24 (37): 11482-11489
被引量:4
标识
DOI:10.1021/acs.nanolett.4c02705
摘要
A novel antiferroelectric material, PbSnO3 (PSO), was introduced into a resistive random access memory (RRAM) to reveal its resistive switching (RS) properties. It exhibits outstanding electrical performance with a large memory window (>104), narrow switching voltage distribution (±2 V), and low power consumption. Using high-resolution transmission electron microscopy, we observed the antiferroelectric properties and remanent polarization of the PSO thin films. The in-plane shear strains in the monoclinic PSO layer are attributed to oxygen octahedral tilts, resulting in misfit dislocations and grain boundaries at the PSO/SRO interface. Furthermore, the incoherent grain boundaries between the orthorhombic and monoclinic phases are assumed to be the primary paths of Ag+ filaments. Therefore, the RS behavior is primarily dominated by antiferroelectric polarization and defect mechanisms for the PSO structures. The RS behavior of antiferroelectric heterostructures controlled by switching spontaneous polarization and strain, defects, and surface chemistry reactions can facilitate the development of new antiferroelectric device systems.
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