钛
材料科学
结晶
X射线光电子能谱
溅射
氧化钛
化学工程
氧化物
基质(水族馆)
溅射沉积
拉曼光谱
薄膜
阳极
无机化学
冶金
纳米技术
电极
化学
光学
物理化学
海洋学
物理
地质学
工程类
作者
Junheng Xing,Hui Li,Zhengbin Xia,Jianfeng Hu,Yanhong Zhang,Zhong Li
出处
期刊:Journal of The Electrochemical Society
[The Electrochemical Society]
日期:2013-01-01
卷期号:160 (10): C503-C510
被引量:8
摘要
Sputter-deposited titanium substrates were anodically treated in sulfuric acid solution both in potentiostatic and potential-sweep modes. The morphology, crystallization, chemical compositions and electrochemical properties of anodic titanium oxide films were detected by AFM, SE, Raman spectra, XPS and EIS. The formed anodic films are smooth and homogeneously crystallized, and that the potentiostatically grown film is slightly thicker and less crystalline than the potentiodynamically formed film. Moreover, a comparison of the structure and properties of the anodic oxides films formed on the mechanical-chemical polished bulk titanium and the sputter-deposited titanium substrates is also presented. The titanium substrates can largely influence the properties of the formed anodic films. A more smooth and compact titanium oxide film could grow on the sputter-deposited titanium substrate, which is unfavorable to the ionic migration through the film and delays the film growth and crystallization.
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