Impact of Fabrication and Operation Errors on Super-Focusing Performance of a Nanoslit-Based Metalens

Metasurfaces with optical manipulation at subwavelength resolution show promises for developing ultrathin and flat optical components, attracting great interest from the optical scientific community. In our recent work, a metalens has demonstrated a special capability of quasi-far-field super-resolution focusing, which comprised a metallic nanoslit array with the incidence of a transverse-electric (TE) polarized light. In this paper, in order to guide practical fabrication and operation of a device, we perform a study on the metalens to analyze the impact of many imperfections on the super-resolution focusing capability. We take fabrication and operation errors into account, including errors in nanoslit width, metal film thickness, operating wavelength, polarization and incident angle of incident light. Numerical results illustrate that the sensitivity of the metalens focusing performance to each error is different. To be specific, the focusing performance of the metalens is considerably susceptible to the error in the incidence angle. Therefore, we not only need to fabricate the metalens device precisely, but also need to ensure that the working conditions agree well with the design, so as to achieve the desired focusing performance. Our research offers a valuable guide for the realization of the super-resolution focusing technology in practice.