润湿
接触角
聚酰亚胺
材料科学
X射线光电子能谱
傅里叶变换红外光谱
悬空债券
分析化学(期刊)
聚合物
破损
复合材料
化学工程
硅
化学
有机化学
图层(电子)
工程类
冶金
作者
Pin-Syuan He,Dinh-Phuc Tran,Ting‐Yu Kuo,Wei-You Hsu,Huai-En Lin,Kai-Cheng Shie,Chih Chen
出处
期刊:Nanomaterials
[Multidisciplinary Digital Publishing Institute]
日期:2023-05-08
卷期号:13 (9): 1575-1575
被引量:15
摘要
In this study, thermal and argon (Ar) plasma/wetting treatments were combined to enhance the bonding strength of polyimide (PI) films. Attenuated total reflectance-Fourier transform infrared spectroscopy (ATR-FTIR) was used to analyze the changes in the PI imidization degrees. The contact angles of the PI films were also measured. The results show that the contact angles of the fully cured PI films markedly decreased from 78.54° to 26.05° after the Ar plasma treatments. X-ray photoelectron spectroscopy (XPS) analysis was also conducted on the PI surfaces. We found that the intensities of the C-OH and C-N-H bonds increased from 0% to 13% and 29% to 57%, respectively, after Ar plasma activation. Such increases in the C-OH and C-N-H intensities could be attributed to the generation of dangling bonds and the breakage of the imide ring or polymer long chains. Shear tests were also conducted to characterize the bonding strength of the PI films, which, after being treated with the appropriate parameters of temperature, plasma power, and wetting droplets, was found to be excellent at greater than 35.3 MPa.
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