共晶体系
整改
偶极子
硅烷
材料科学
金属
分子
单层
硅
镓
结晶学
化学
纳米技术
合金
光电子学
有机化学
物理
冶金
功率(物理)
复合材料
量子力学
作者
Zachary A. Lamport,Angela D. Broadnax,David Harrison,Katrina Barth,Lee Mendenhall,Clayton T. Hamilton,Martin Guthold,Timo Thonhauser,Mark E. Welker,Oana D. Jurchescu
摘要
Abstract We report on the synthesis and electrical properties of nine new alkylated silane self-assembled monolayers (SAMs) – (EtO) 3 Si(CH 2 ) n N = CHPhX where n = 3 or 11 and X = 4-CF 3, 3,5-CF 3 , 3-F-4-CF 3 , 4-F, or 2,3,4,5,6-F, and explore their rectification behavior in relation to their molecular structure. The electrical properties of the films were examined in a metal/insulator/metal configuration, with a highly-doped silicon bottom contact and a eutectic gallium-indium liquid metal (EGaIn) top contact. The junctions exhibit high yields (>90%), a remarkable resistance to bias stress, and current rectification ratios (R) between 20 and 200 depending on the structure, degree of order, and internal dipole of each molecule. We found that the rectification ratio correlates positively with the strength of the molecular dipole moment and it is reduced with increasing molecular length.
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