肖特基势垒
肖特基二极管
半导体
材料科学
金属半导体结
光电子学
钨
电流(流体)
电压
纳米技术
电子工程
电气工程
二极管
工程类
冶金
作者
Alessandro Grillo,Antonio Di Bartolomeo
标识
DOI:10.1002/aelm.202000979
摘要
Abstract Schottky barriers (SBs) are often formed at the semiconductor/metal contacts and affect the electrical behavior of semiconductor devices. In particular, SBs are playing a major role in the investigation of the electrical properties of mono and 2D nanostructured materials, although their impact on the current–voltage characteristics is frequently neglected or misunderstood. In this work, a single equation is proposed to describe the current–voltage characteristics of two‐terminal semiconductor devices with Schottky contacts. The equation is applied to numerically simulate the electrical behavior for both ideal and nonideal SBs. The proposed model can be used to directly estimate the SB height and the ideality factor. It is applied to perfectly reproduce the experimental current–voltage characteristics of ultrathin molybdenum disulfide or tungsten diselenide nanosheets and tungsten disulfide nanotubes. The model constitutes a useful tool for the analysis and the extraction of relevant transport parameters in any two‐terminal device with Schottky contacts.
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