Importance of crystallinity improvement in MoS2 film by compound sputtering even followed by post sulfurization

Abstract The MoS 2 film for chip-size area was synthesized by two step processes consisting of MoS 2 -compound sputtering and post sulfurization. We intentionally revealed that the crystallinity of sulfurized MoS 2 film depends on that of just-after-sputtered film. Therefore, a crystallinity improvement just-after sputtering is mandatory to achieve an excellent quality MoS 2 film after sulfur-vapor annealing for thin film transistor, sensor and human interface device applications.