Electrical conduction properties of n-type Si-doped AlN with high electron mobility (>100cm2V−1s−1)
作者
Yoshitaka Taniyasu,Makoto Kasu,Toshiki Makimōto
出处
期刊:Applied Physics Letters [American Institute of Physics] 日期:2004-11-15卷期号:85 (20): 4672-4674被引量:139
标识
DOI:10.1063/1.1824181
摘要
For n-type Si-doped AlN, we have obtained an electron mobility and concentration of 125cm2V−1s−1 and 1.75×1015cm−3 at 300K, respectively. At 250K, the mobility reached the maximum of 141cm2V−1s−1. To explain the temperature dependence of the mobility, we calculated mobilities limited by specific scattering mechanisms. We found that the mobility is limited by neutral impurity scattering rather than ionized impurity scattering or lattice scattering because of a large donor ionization energy (∼250meV).