Application of Pulsed Sputtering Technology in Aluminum Oxide Films Deposition

Pulsed sputtering is a new kind of technology used to eliminate the abnormal discharge during DC reactive sputtering.Aluminum oxide films were prepared by pulsed magnetron reactive sputtering with a metal aluminum target and a self-made pulsed power supply.The relation between the abnormal discharge's suppression and the pulsed sputtering parameters was given.The effects of sputtering parameters on the deposition rate and the refractive index of aluminum oxide film were also described in detail.