Physical model of threshold voltage in siliconMOS transistors including reverse short channel effect
作者
H. Brut,A. Juge,G. Ghibaudo
出处
期刊:Electronics Letters [Institution of Engineering and Technology] 日期:1995-03-02卷期号:31 (5): 411-412被引量:15
标识
DOI:10.1049/el:19950233
摘要
A physically based model for the MOSFET threshold voltage accounting for the reverse short channel effect is proposed. This threshold voltage model, which incorporates the inhomogeneous transverse and longitudinal doping profiles as well as the conventional charge sharing short channel effect, has been successfully tested on several submicronic technologies with various channel lengths.