碲化镉光电
光伏系统
材料科学
等离子体
蚀刻(微加工)
光电子学
能量转换效率
等离子体刻蚀
纳米技术
图层(电子)
电气工程
工程类
物理
量子力学
作者
Fan He,Sen Lin,Lili Wu,Xia Hao,Dewei Zhao,Jingquan Zhang,Liang-Huan Feng
标识
DOI:10.1088/1361-6463/abfefb
摘要
Ultrathin CdTe solar cell is a promising application of using integrated photovoltaics to act as architectural components and bifacial devices to promote the utilization of sunlight. In the preparation process of the ultrathin CdTe solar cells, the chemical solution etching process before back contact deposition has to be refrained due to the high risk of shunting. Therefore, an alternative strategy to get a clean CdTe surface is required. In this work, plasma etching treatment was conducted on sputtered ultrathin CdTe films to eliminate the residual oxides induced by CdCl2 treatment. Furthermore, ultrathin bifacial CdTe solar cells with a structure of glass/FTO/SnO2/CdS/CdTe (∼920 nm)/CuCl/ITO were fabricated to investigate the effect of plasma etching on the device performance. As a result, by employing plasma etching treatment, a bifacial device with a front illuminated efficiency of up to 9.93% and a rear illuminated efficiency of 2.41% was achieved. This work provides important indications for the performance optimization of ultrathin CdTe solar cells.
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