抛光
纳米尺度
化学机械平面化
材料科学
比例(比率)
曲面(拓扑)
纳米技术
原子单位
冶金
物理
几何学
数学
量子力学
作者
Feng Zhao,Zhenyu Zhang,Xingqiao Deng,Junyuan Feng,Hongxiu Zhou,Zhensong Liu,Fanning Meng,Chunjing Shi
出处
期刊:Nanoscale
[Royal Society of Chemistry]
日期:2024-01-01
卷期号:16 (5): 2318-2336
被引量:62
摘要
combining Eulerian and Lagrangian functions showed that the stress at the intersections of the fibers varied mainly from 0.1 to 0.01 MPa and was higher than the stress at other parts. An increase in viscosity led to a decrease in the areas with low stress, demonstrating that viscosity enhanced the stress and facilitated the removal of material. At the microscale and nanoscale, the stress of the abrasive surface exposed to the workpiece changed from 2.21 to 6.43 GPa. Stress at the interface contributed to the formation of bridging bonds, further promoting the removal of material. With increasing the compressive stress, the material-removal form was transformed from a single atom to molecular chains. The proposed model and developed green CMP offer new insights to understand the cross-scale polishing mechanism, as well as for designing and manufacturing novel polishing slurries, pads, and setups.
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