载流子寿命
俄歇效应
螺旋钻
钝化
硅
材料科学
重组
自发辐射
光电子学
兴奋剂
原子物理学
计算物理学
物理
光学
化学
纳米技术
激光器
生物化学
图层(电子)
基因
作者
Armin Richter,Florian Werner,A. Cuevas,Jan Schmidt,Stefan W. Glunz
标识
DOI:10.1016/j.egypro.2012.07.034
摘要
Accurate modeling of the intrinsic recombination in silicon is important for device simulation as well as for interpreting measured effective carrier lifetime data. In this contribution we study the injection-dependent effective carrier lifetime applying advanced surface passivation techniques based on Al2O3 or SiNx We show that in some cases the measured lifetime data significantly exceeds the previously accepted intrinsic lifetime limit proposed by Kerr and Cuevas [1]. To verify our measurements we independently perform lifetime measurements with different measurement techniques in two different laboratories. Based on effective lifetime measurements we develop an advanced parameterization of the intrinsic lifetime in crystalline silicon at 300 K as a function of the doping density and the injection level, which accounts for Coulomb-enhanced Auger recombination and Coulomb-enhanced radiative recombination.
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