强化学习
计算机科学
过程(计算)
贝叶斯推理
化学机械平面化
方案(数学)
推论
控制器(灌溉)
过程控制
半导体器件制造
非线性系统
控制工程
贝叶斯概率
机器学习
人工智能
工程类
数学
物理
农学
数学分析
抛光
电气工程
操作系统
生物
薄脆饼
机械工程
量子力学
作者
Yanrong Li,Juan Du,Wei Jiang,Fugee Tsung
标识
DOI:10.1080/24725854.2024.2384965
摘要
Design of process control scheme is critical for quality assurance to reduce variations in manufacturing systems. Taking semiconductor manufacturing as an example, extensive literature focuses on control optimization based on certain process models (usually linear models), which are obtained by experiments before a manufacturing process starts. However, in real applications, pre-defined models may not be accurate, especially for a complex manufacturing system. To tackle model inaccuracy, we propose a model-free reinforcement learning (MFRL) approach to conduct experiments and optimize control simultaneously according to real-time data. Specifically, we design a novel MFRL control scheme by updating the distribution of disturbances using Bayesian inference to reduce their large variations during manufacturing processes. As a result, the proposed MFRL controller is demonstrated to perform well in a nonlinear chemical mechanical planarization (CMP) process when the process model is unknown. Theoretical properties are guaranteed when disturbances are additive. The numerical studies also demonstrate the efficiency of our methodology.
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