Hardness Enhancement in CoCrFeNi1−x(WC)x High-Entropy Alloy Thin Films Synthesised by Magnetron Co-Sputtering

We demonstrate the systematic hardness enhancement of the CoCrFeNi high-entropy alloy (HEA) by the addition of tungsten carbide (WC). Mixed thin films are fabricated by magnetron co-sputtering using a home-made spark plasma-sintered CoCrFeNi target and a commercially available WC target. The WC content in the thin films is adjusted via the ratio of deposition powers applied to the targets. X-ray photoelectron spectroscopy (XPS) and energy dispersive X-ray spectroscopy (EDX) measurements were taken to determine the surface and bulk stoichiometry, respectively. The uniform distribution of the elements is confirmed via EDX mapping. X-ray diffraction (XRD) is carried out on the samples to determine the crystal phase formation. The Vickers hardness of the thin films is investigated using nanoindentation and shows an increase in the hardness in the thin films following an increased WC content. The data obtained are presented in comparison to pure WC and CoCrFeNi thin films fabricated by magnetron sputtering, respectively.