We have developed a “two‐step” solution‐based processing to deposit high‐ k ceramic thin films. Electrochemically pre‐coated amorphous titania layers were “hydrothermally” or “hydrothermal‐electrochemically” converted to crystalline BaTiO 3 films at ≤90°C. In hydrothermal process, an in situ electrochemical protection ( ECP ) mechanism enables utilization of common metallic substrates (e.g., Cu ), which otherwise suffer corrosion from the precursor. Microstructural evolution of BaTiO 3 films along with the effectiveness of ECP is discussed in this article. Derived BaTiO 3 shows a dielectric constant of ~80 at 100 kHz, which makes it a promising candidate for high‐density microelectronic capacitor applications.