Roller nanoimprint lithography

An alternative approach to flat nanoimprint lithography (NIL)—roller nanoimprint lithography (RNIL) is demonstrated. Compared with flat NIL, RNIL has the advantage of better uniformity, less force, and the ability to repeat a mask continuously on a large substrate. Two methods for RNIL are developed: (a) rolling a cylinder mold on a flat, solid substrate; (b) putting a flat mold directly on a substrate and rolling a smooth roller on top of the mold. Using our current roller nanoimprint system, sub-100 nm resolution pattern transfer has been achieved.