Electrochemical reduction of carbon dioxide to formate in a flow cell on CuSx grown by atomic layer deposition

Funding Information: M.P. acknowledges funding from the Academy of Finland by the profiling action on Matter and Materials (grant no. 318913). M.S. and T.K. acknowledge funding from Jane and Aatos Erkko foundation (the USVA project). Dr. Timo Hatanpää is thanked for synthesizing the Cu(dmap) 2 precursor. Mr. Chao Zhang is thanked for the ALD copper film depositions. Dr. Lilian Moumaneix is thanked for the TEM images. This work made use of Aalto University RawMatters, Bioeconomy, and OtaNano Low Temperature Laboratory and Nanomicroscopy Center facilities, and the ALD center Finland research infrastructure. Publisher Copyright: © 2023 The Author(s)