跨导
材料科学
兴奋剂
光电子学
阈值电压
电压
频道(广播)
砷化镓
无线电频率
电容
电气工程
电子工程
作者
Priyanshi Goyal,Harsupreet Kaur
标识
DOI:10.1109/icdcs54290.2022.9780724
摘要
In the present work, dual material gate and step doping in channel have been implemented on Beta - Gallium Oxide (βGa2 O3) to investigate its suitability for high performance RF applications. Several device attributes such as drain current, transconductance, intrinsic gate capacitances etc., have been studied which have been further used to evaluate Figure of merits i.e. cut-off frequency and transconductance frequency product etc. Furthermore, the effect of channel thickness on critical parameters such as threshold voltage and ON-state resistance has also been studied. In addition, the results obtained for the proposed device have been compared with the conventional device and it is demonstrated that the proposed device exhibits superior characteristics with improved aforementioned Figure of merits.
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