环形振荡器
振荡(细胞信号)
MOSFET
辐照
指数函数
材料科学
吸收剂量
戒指(化学)
光电子学
物理
计算物理学
原子物理学
电压
数学
晶体管
化学
核物理学
数学分析
量子力学
生物化学
有机化学
CMOS芯片
作者
Arisa Kimura,Kaito Kuroki,Ryoichiro Yoshida,Kenji Hirakawa,Masayuki Iwase,Munehiro Ogasawara,Takashi Yoda,Noboru Ishihara,Hiroyuki Ito
标识
DOI:10.35848/1347-4065/acb218
摘要
Abstract The response of N-type MOSFET characteristics to TID (Total Ionizing Dose) effects caused by γ -ray irradiation was modeled as a sum of two exponential functions which expresses the charge accumulation of the oxide traps and the interface traps respectively. This model was applied to the circuit simulation of a ring oscillator operation. It was shown that the simulation result reproduces the variation in the measured oscillation frequency experimentally. The simulation also showed that there is an optimum size ratio between N-type MOSFET and P-type MOSFET which can minimize the variation in oscillation frequency due to TID effects. These obtained results verified that the proposed method can be applied to the prediction of response in a dynamic operation circuit to TID effects.
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