Investigation of Parameters for Schottky Barrier (SB) Height for Schottky Barrier Based Carbon Nanotube Field Effect Transistor Device

The design and development of Schottky Barrier Carbon Nanotube Field Effect Transistor (SB CNTFET) is still in the primitive research phase for its utilization in digital design. There is an immediate requirement for the analysis of parametric relations with structural factors to benefit the researchers working in this field. This work helps in the improvement of SB based CNTFET devices to be used in the development of various circuit applications. In this work, investigation of Schottky Barrier height on the performance of SB CNTFET for various geometrical and physical design parameters at the device level has been reported. The analysis of various device parameters of carbon nanotube, i. e., chirality, diameter, band gap, oxide thickness and dielectric constant has been carried out viz. subthreshold conduction, and ION/IOFF ratio. The paper also reports the effect of high dielectric constant material in SB CNTFET with oxide thickness along with Schottky Barrier Height Variation. The performance of SB CNTFET with variation in Schottky Barrier height and temperature variation is also reported. The results obtained indicate that performance of SB based CNTFET can be modified by the proper choice of chirality, dielectrics, oxide thickness and operating temperature. The SB parameter can be optimized by proper choice of metal contact in case of CNTFET.