期刊:CrystEngComm [The Royal Society of Chemistry] 日期:2025-01-01卷期号:27 (9): 1341-1345
标识
DOI:10.1039/d4ce01305k
摘要
Using molecular beam epitaxy (MBE), h-GaTe thin films were successfully grown on highly oriented pyrolytic graphite (HOPG) substrates by co-deposition of Ga and Te.