熔块
硼硅酸盐玻璃
材料科学
润湿
薄脆饼
图层(电子)
复合材料
接触角
电阻率和电导率
导电体
微观结构
光电子学
电气工程
工程类
作者
Yusuke Tachibana,Akifumi Matsuda,Mamoru Yoshimoto
标识
DOI:10.35848/1347-4065/abaebb
摘要
In an application for metallization contact of Ag thick-film conductor onto the SiNx-coated Si wafer for solar cells, we examined the wettability, reactivity, microstructure, and electrical contact of two kinds of glass frits: lead borosilicate and lead tellurite. The lead tellurite frit exhibited superior wettability on Si and higher reactivity with SiNx and formed the thinner glass layer between Ag rich layer and Si for firing the Ag thick-film paste at 750 °C, resulting in better conductive contacts. The contact resistivity of Ag thick-film conductor using lead tellurite glass frit was less than one-tenth of that using lead borosilicate glass frit.
科研通智能强力驱动
Strongly Powered by AbleSci AI