High Thermally Stable Anthracene-Based Polyimides with Low Dielectric Constants and Dissipation Factors

电介质 材料科学 高分子化学 热分解 玻璃化转变 耗散因子 介电损耗 聚酰亚胺 聚合物 复合材料 物理化学 化学工程 化学 有机化学 图层(电子) 光电子学 工程类
作者
Yueh‐Hsing Lee,Jin-Wei Lin,Yu-Chen Huang,Yung‐Jen Huang,Manohar Reddy Busireddy,Jiun‐Tai Chen,Chain‐Shu Hsu
出处
期刊:ACS applied polymer materials [American Chemical Society]
卷期号:5 (12): 10196-10204 被引量:18
标识
DOI:10.1021/acsapm.3c02003
摘要

At present, high-performance polymers with low dielectric constants (Dk) and low dissipation factors (Df) have gained much attention with the rapid evolution of microelectronic and 5G communication technologies. Due to their excellent thermal stabilities, heat resistances, mechanical strengths, and dielectric properties, polyimides (PIs) have attracted a lot of attention. Herein, a series of anthracene (An)-based PIs are synthesized from an ester-functionalized anthracene diamine (An-NH2) monomer and four kinds of commercial dianhydrides such as keto (3,3′,4,4′-benzophenonetetracarboxylic dianhydride (BTDA)), sulfone (3,3′,4,4′-diphenylsulfone tetracarboxylic dianhydride (DSDA)), fluoro (4,4′-(hexafluoroisopropylidene)diphthalic anhydride (6FDA)), and ether (4,4′-(4,4′-isopropylidenediphenoxy)bis(phthalic anhydride) (BPADA) and 4,4-oxydiphthalic anhydride (ODPA)) functional groups by a two-step process, i.e., the chemical polyaddition followed by thermal imidization. The resulting An-NH2/BTDA, An-NH2/DSDA, An-NH2/6FDA, An-NH2/BPADA, and An-NH2/ODPA PIs are denoted as AnBT-PI, AnDS-PI, An6F-PI, AnBPA-PI, and AnOD-PI, respectively. As a result, all An-based PI films display excellent thermal properties, with thermal decomposition temperatures of 450–530 °C (Td5% weight loss) and glass transition temperatures (Tg) of 270–410 °C. In addition, these PI films exhibit decent optical transparency, flexibility, coefficient of thermal expansion (CTE), and mechanical properties. Remarkably, all An-based PI films show excellent dielectric properties with a low Dk of 2.540–3.388 and a Df of 0.0059–0.0240 at high frequency (10 GHz). In particular, the An-based PI films with ether linkages (AnOD-PI and AnBPA-PI) and a high fluorine content (An6F-PI) show low Dk and Df values compared with those with keto (AnBT-PI) and sulfone (AnDS-PI) linkages. These results indicate that the An-based PIs are promising candidates for achieving low Dk and Df values at higher frequencies. Overall, we believe this study will provide useful guidelines for the further structural development of An-based PIs with low Dk and Df.
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