Loss Analysis of a 24.4%-Efficient Front-Junction Silicon Heterojunction Solar Cell and Opportunity for Localized Contacts

薄脆饼 光电子学 异质结 材料科学 堆栈(抽象数据类型) 能量转换效率 聚合物太阳能电池 晶体硅 计算机科学 光学 物理 程序设计语言
作者
Mathieu Boccard,Luca Antognini,Jean Cattin,Julie Dréon,Wenjie Lin,Vincent Paratte,Deniz Türkay,Christophe Ballif
出处
期刊:IEEE Journal of Photovoltaics [Institute of Electrical and Electronics Engineers]
卷期号:13 (5): 663-671 被引量:8
标识
DOI:10.1109/jphotov.2023.3291050
摘要

Silicon heterojunction (SHJ) solar cells have recently reached power conversion efficiencies above 25% with various device architectures and with industrial size (>200 cm 2 ) wafers. Yet, for an accurate assessment of the efficiency potential and further development of the technology, the identification of high-performing device configurations, and their detailed analysis is still vital. In this work, we first present an overview of our lab-scale (4 cm 2 ) front-junction cells based on n-type wafers with a 24.44% certified efficiency. We report on the key improvements compared with our previously reported devices (i.e., thinner front-side silicon layers and low refractive index rear reflector). Then, we present a detailed power loss analysis, showing that parasitic absorption in the front layer-stack remains a major source of loss despite the recent improvements. Accordingly, we investigate next approaches to circumvent this loss, such as localization of the highly absorbing front layers and switching to a rear-junction architecture. Using numerical calculations, we show that the front-junction configuration can benefit from an efficiency gain of 0.3% abs with contact localization if considerably low contact resistivities (<20 mΩ·cm 2 ) are realized for the p-type contact. Even larger gain in efficiency can be achieved by simultaneously switching to a rear-junction architecture and localizing the n-type contact with contact resistivities that are relatively accessible with the current state of the art (up to 0.7% abs gain for <20 mΩ·cm 2 ). Finally, we propose a simple fabrication method for contact localization using shadow masks during depositions of the front-side layers and demonstrate proof-of-concept cells with localized contacts.
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