Preparation and Characterization of Methacrylate Photoresist

Methacrylate photoresist was one of the tradition photoresists and it had high transparent and resolution.Methyl methacylate/methacylic acid/methacrylogl chloride terpolymer was synthesized by free radical solution polymerization in dioxane solvent with the azobisisbutyronitrile used as the initiator.Allyl alcohol was used for preparation methacrylate photosensitive polymer with allyl in side chain.The structure of product was confirmed by FTIR and 1HNMR spectroscopy,and the molecular weight of the terpolymer was measured by GPC.The effects of the amount of initiator,polymerization temperature and the monomer ratio were discussed.And its exposure performance was also studied.