X射线光电子能谱
图层(电子)
材料科学
原子层沉积
石墨
电解质
硅
阳极
钝化
介电谱
电化学
扫描电子显微镜
纳米技术
锂(药物)
化学工程
分析化学(期刊)
光电子学
复合材料
电极
化学
物理化学
内分泌学
工程类
医学
色谱法
作者
Prangya Parimita Sahoo,Alper Güneren,Boris Hudec,Miroslav Mikolášek,Ahmed A. Nada,Magdaléna Precnerová,Matej Mičušík,Zoltán Lenčéš,Peter Nádaždy,K. Fröhlich
标识
DOI:10.1021/acsanm.3c05066
摘要
Silicon (Si) is a promising anode material due to its high theoretical capacity and abundant presence as the second most common element in the earth’s crust. However, the formation of an unstable solid-electrolyte interphase (SEI) and significant volume expansion during lithiation result in structural degradation, leading to a decrease in the cycle life for Si-based anodes. This paper reports on the electrochemical performance of the silicon/graphite (Si/Gr) electrodes coated with nanometer-thick ZnO layers prepared by atomic layer deposition (ALD). In our study, ZnO layers were deposited using 5–40 ALD cycles on Si/Gr electrodes of ∼20 μm thickness. Electrochemical measurements such as galvanostatic charging/discharging at different C-rates and electrochemical impedance spectroscopy were performed utilizing the pristine and 5–40 ALD cycles of ZnO on Si/Gr electrodes in a half-cell configuration. The Si/Gr electrodes (pristine and ZnO-coated) were analyzed by scanning electron microscopy and X-ray photoelectron spectroscopy (XPS) before and after electrochemical cell cycling. The ZnO-coated samples showed a better electrochemical rate performance than the uncoated pristine Si/Gr sample. The reversible conversion of the ZnO ALD films was demonstrated through d Q /d V plots and XPS analysis during (de)lithiation. The ultrathin ZnO layers passivate the underlying Si/Gr electrodes, help in the formation of a stable SEI layer, and facilitate lithium-ion transport through the SEI layer.
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