材料科学
退火(玻璃)
薄膜晶体管
晶体管
制作
结晶
光电子学
溶剂
薄膜
溶解过程
复合材料
纳米技术
化学工程
电压
电气工程
有机化学
图层(电子)
医学
化学
替代医学
工程类
病理
作者
Kimberly Dickey,John E. Anthony,Yueh‐Lin Loo
标识
DOI:10.1002/adma.200690053
摘要
Abstract In work reported by Loo and co‐workers on p. 1721, the current–voltage characteristics of triethylsilylethynyl anthradithiophene (TES ADT) thin‐film transistors are improved dramatically by a simple solvent‐vapor annealing process after device fabrication. Exposing the transistors to dichloroethane vapor induces structural rearrangement and crystallization of TES ADT, as shown on the cover (lower section, before annealing, upper section, after). The annealing results in drastic increases in on currents; the saturation mobility increases by two orders of magnitude and the current–voltage hysteresis is largely eliminated.
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