材料科学
光电子学
半导体
电介质
磁滞
范德瓦尔斯力
电压
电容器
MOSFET
工程物理
硅
纳米技术
阈下传导
泄漏(经济)
缩放比例
阈下斜率
肖特基势垒
删除
电子工程
CMOS芯片
逻辑门
电气工程
非易失性存储器
阈值电压
肖特基二极管
热的
接口(物质)
不稳定性
作者
Ni Yang,Ji Zhang,Yu-Cheng Lu,Zeheng Wang,Yu-Ming Chang,Fangyuan Zheng,Zi‐Liang Yang,Lingqi Li,Ang‐Sheng Chou,Zongmeng Yang,Haomin Liu,Lin-Yun Huang,Chenyang Li,Chengdong Yao,Pengfei Yang,Wanying Li,Wanqing Meng,Ming‐Yang Li,Chao-Ching Cheng,Dong‐Keun Ki
出处
期刊:Nature
[Nature Portfolio]
日期:2026-11-11
标识
DOI:10.1038/s41586-026-11272-2
摘要
Abstract Aggressive scaling in silicon electronics—although essential for improving power, performance, area and cost—faces increasing challenges in further reducing power consumption due to electrostatic and leakage constraints 1,2 . Achieving efficient operation at low supply voltages therefore requires new materials and gate-stack engineering strategies. Two-dimensional (2D) semiconductors offer intrinsic advantages because their atomic thickness affords excellent gate control, and their sizable bandgaps suppress off-state current. However, a major obstacle is the imperfect interface between 2D channels and gate dielectrics, which degrades subthreshold swing, hysteresis and bias-temperature instability 3 . Here we demonstrate that a wafer-scale, transferable, single-crystal anatase titanium dioxide dielectric can be van der Waals integrated with 2D transition metal dichalcogenides. The obtained pristine 2D-dielectric interface enables subthreshold swing close to the thermal limit, record-low hysteresis and well-matched transfer characteristics for both n- and p-type enhancement-mode field-effect transistors. Building on this, we demonstrate complementary field-effect transistors, whose inverters achieve high voltage gain and large noise margins with subpicowatt static power consumption. These results highlight the promise of 2D semiconductors for ultra-low-power operation.
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