E. Kamińska,A. Piotrowska,A. Barcz,K. Gołaszewska,A. Kuchuk,J. Szade,A. Winiarski,A. Wawro,Jacek B. Jasiński,Z. Liliental‐Weber
标识
DOI:10.1109/commad.2002.1237184
摘要
The fabrication procedure of transparent and conducting ZnO films yielding ohmic contacts to p-GaN has been developed. The microstructure and electronic properties of p-GaN/ZnO interface were studied using atomic force and electron transmission microscopies, and X-ray photoelectron spectrometry. The observed ohmic behaviour is explained in terms of formation of a tunnelling p-GaN/ n/sup +/-ZnO junction.