Lv11
30 积分 2025-09-29 加入
Decoupling Moisture and Hydrogen Barrier Properties in Silicon Nitride Films Deposited by Plasma-Enhanced Atomic Layer Deposition at 100 °C via Precursor-Defined Bonding Networks
10小时前
待确认
Suppression of Hydrogen Incorporation by Substrate Bias in NH 3 ‐Free ICP‐CVD SiN x Thin Film Deposition
11小时前
已完结
Gas barrier properties of SiON films deposited by plasma enhanced chemical vapor deposition at low temperature as a function of the plasma process parameters
17天前
已完结
Effect of plasma power on growth process, chemical structure, and properties of PECVD films produced from hexamethyldisilane and ammonia
21天前
已完结
Novel tunnel nitride (TN) formation using NH3/N2 plasma nitridation for enhanced interfacial passivation and efficient tunneling in TOPCon solar cells
22天前
已完结
Impacts of SiN deposition parameters on n-channel metal-oxide-semiconductor field-effect-transistors
22天前
已完结
Refractive index properties of SiN thin films and fabrication of SiN optical waveguide
22天前
已完结
Study of mechanical degradation of freestanding ALD Al 2 O 3 by a hygrothermal environment and a facile protective method for environmentally stable Al 2 O 3 : toward highly reliable wearable OLEDs
23天前
已完结
Effect of H 2 addition during PECVD on the moisture barrier property and environmental stability of H:SiN x film
1个月前
已完结
24‐4: Research on Water Vapor Penetration of OLED Encapsulation
1个月前
已完结
皖公网安备34019202002308
