Lv41
434 积分 2022-07-14 加入
A molecular dynamics study of deposition rate dependence of film morphology in the sputtering process
11分钟前
待确认
Atomistic calculation of the SiH3 surface reactivity during plasma deposition of amorphous silicon thin films
16分钟前
已完结
Titanium nitride oxidation chemistry: An x-ray photoelectron spectroscopy study
10天前
已完结
Discrete Mono-, Di-, and Trinuclear Anions [MoOF5]−, [MoVOF5]2–, [MoO2F4]2–, [Mo2O2F9]−, [Mo3O3F13]−, and the Infinite Chain Anion [MoO2F3]− Obtained from Reactions of MoOF4: Synthesis and Analysis of the Structure-Chemical Relations of the Compounds
10天前
已完结
Spontaneous etching of B2O3 by HF gas studied using infrared spectroscopy, mass spectrometry, and density functional theory
10天前
已完结
WO3 and W Thermal Atomic Layer Etching Using “Conversion-Fluorination” and “Oxidation-Conversion-Fluorination” Mechanisms
10天前
已完结
Thermal Selective Vapor Etching of TiO2: Chemical Vapor Etching via WF6 and Self-Limiting Atomic Layer Etching Using WF6 and BCl3
11天前
已完结
Prediction and Validation of the Process Window for Atomic Layer Etching: HF Exposure on TiO2
11天前
已完结
Adsorption Configurations and Energetics of BClx (x = 0−3) on TiO2 Anatase (101) and Rutile (110) Surfaces
11天前
已完结
A selective etching phenomenon on {001} faceted anatase titanium dioxide single crystal surfaces by hydrofluoric acid
11天前
已完结
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