Lv3
340 积分 2024-03-07 加入
Effects of KIO4 concentration and pH values of the solution relevant for chemical mechanical polishing of ruthenium
1个月前
已关闭
Effect of Oxidizers on Chemical Mechanical Planarization of Ruthenium with Colloidal Silica Based Slurry
1个月前
已关闭
Development and Optimization of Slurry for Ru CMP
1个月前
已完结
Tm-Substituted 2:17-type magnets: balancing room-temperature magnetic properties and temperature stability
2个月前
已完结
Galvanic Corrosion Between TaN[sub x] Barriers and Copper Seed
3个月前
已完结
In-situ scanning electron microscope observation of electromigration-induced void growth in 30 nm ½ pitch Cu interconnect structures
3个月前
已完结
Study on synergetic effect of potassium pyrophosphate and benzotriazole on chemical mechanical planarization of GLSI low-technology node molybdenum barrier layer
3个月前
已关闭
Molecular interactions of amino acids for corrosion control in molybdenum CMP through bridging experimental insights and DFT simulations
3个月前
已完结
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