| 标题 |
Effect of HCl on the SiGe growth kinetics in reduced pressure—chemical vapor deposition |
| 网址 | |
| DOI | |
| 其它 |
期刊:Journal of Crystal Growth 作者:J.M. Hartmann; F. Champay; V. Loup; G. Rolland; M.N. Séméria 出版日期:2002-05-01 |
| 求助人 | |
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(2025-6-4)