| 标题 |
Effect of Organic Ligand Structure on Resist Performance of Inorganic-Organic Hybrid Resist Materials for EB and EUV Lithography |
| 网址 | |
| DOI |
10.2494/photopolymer.39.197
doi
|
| 其它 |
期刊:Journal of Photopolymer Science and Technology 作者:Hiroki Yamamoto; Takashi Hamada; Takahiro Kozawa 出版日期:2026-07-31 |
| 求助人 | |
| 下载 | 求助已完成,仅限求助人或该文件上传人下载。 |
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(2025-6-4)