| 标题 |
 New Insights into the Imprint Effects in Hf-based Ferroelectric Capacitors: Intrinsic Imprint, Universal De-Imprint, AC Enhanced Imprint, and Unified Modeling of Defect Dynamics |
| 网址 | |
| DOI | |
| 其它 |
期刊：2025 IEEE International Electron Devices Meeting (IEDM) 作者：Hao Li; Keying Sun; Chen Zhang; Haoran Wang; Yue-Yang Liu; et al 出版日期：2025 |
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(2025-6-4)
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