| 标题 |
Investigations of titanium nitride as metal gate material, elaborated by metal organic atomic layer deposition using TDMAT and NH3 |
| 网址 | |
| DOI | |
| 其它 |
期刊:Microelectronic Engineering 作者:F. Fillot; T. Morel; S. Minoret; I. Matko; S. Maîtrejean; et al 出版日期:2005-08-30 |
| 求助人 | |
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(2025-6-4)