| 标题 |
Advanced Atomic-scale Insights into the Chemical Mechanical Polishing Process with Ceria Abrasives using Molecular Dynamics and Neural Network Potential |
| 网址 | |
| DOI | |
| 其它 |
期刊:Electronic Components and Technology Conference 作者:Yoshishige Okuno; Teruo Hirakawa; Fukiko Ota; Yuuto Kurata; Akihiro Orita; et al 出版日期:2024-05-28 |
| 求助人 | |
| 下载 |
PDF的下载单位、IP信息已删除
(2025-6-4)