| 标题 |
Two-photon nanolithography of positive photoresist of AZ 5214E with a spatial resolution at nanoscale |
| 网址 | |
| DOI | |
| 其它 |
期刊:Journal of Micro/Nanopatterning, Materials, and Metrology 作者:Guo-Juan Xu; Qian-Hua Li; Chang Cheng; Rong Zou; Xiao-Jie Li; et al 出版日期:2023-03-02 |
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(2025-6-4)