| 标题 |
Demonstration of spatially programmable chemical vapor deposition: Model-based uniformity∕nonuniformity control |
| 网址 | |
| DOI | |
| 其它 |
期刊:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena 作者:Ramaswamy Sreenivasan; Raymond A. Adomaitis; Gary W. Rubloff 出版日期:2006 |
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(2025-6-4)