| 标题 |
Film and surface stress during Al2O3 thermal atomic layer etching using in situ wafer curvature measurements |
| 网址 | |
| DOI | |
| 其它 |
期刊:Journal of Vacuum Science & Technology A 作者:Ryan B. Vanfleet; Victor M. Bright; Steven M. George 出版日期:2026-04-28 |
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(2025-6-4)