| 标题 |
Circular ferroelectric tunnel junctions for the improvement of memory window and endurance |
| 网址 | |
| DOI | |
| 其它 |
期刊:Japanese Journal of Applied Physics 作者:Dong-Oh Kim; Changha Kim; Hyun-Min Kim; Jonghyuk Park; Bosung Jeon; et al 出版日期:2023-03-23 |
| 求助人 | |
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(2025-6-4)