| 标题 |
Enhanced Area-Selective Deposition via NH3 Plasma Treatment in Atomic Layer Deposition for Si/TiN Substrates |
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| DOI | |
| 其它 |
期刊:ACS Applied Materials and Interfaces 作者:Jeong Hyeon Park; Yoona Choi; S. Yoo; Haeryong Kim; Woojin Jeon 出版日期:2025-11-10 |
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(2025-6-4)